Supercritical Fluid Technologies
Research at the Supercritical Fluids Facility has produced some important technologies, two of which have received the presitgious R&D 100 Award: DryWash™ (1997) and SCORR (2001; 2002 Presidential Green Chemistry Award). Technologies developed at the facility use supercritical carbon dioxide as a specialized liquid to replace harmful dry-cleaning solvents, as a removal agent to clear away photoresist residue from silicon wafers, and as a substance for cleaning precision parts. Click a link on the left or below to explore these technologies in greater detail.
Operated by the